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What is TC wafer and where it is used?
A TC wafer, in the context of wafer temperature measurement, typically refers to a “Thermocouple Wafer.” This is a specialized wafer equipped with thermocouples or other temperature sensors used to measure and monitor the temperature of wafers during semiconductor manufacturing processes, such as chemical vapor deposition (CVD), etching, and annealing.
Features of TC Wafers
Embedded Thermocouples:
TC wafers have thermocouples embedded at various points to provide accurate and real-time temperature measurements across the wafer surface.
High-Temperature Range:
These wafers can withstand and accurately measure a wide range of temperatures, which is critical for processes that involve high temperatures.
Uniformity Measurement:
TC wafers help in assessing temperature uniformity across the wafer, which is crucial for ensuring consistent process results and high-quality semiconductor devices.
Real-Time Monitoring:
They provide real-time temperature data, enabling process engineers to make immediate adjustments to maintain optimal conditions during manufacturing.
Calibration and Process Control:
TC wafers are used for calibrating temperature settings in semiconductor equipment, ensuring that the actual temperatures match the setpoints.
Compatibility with Process Equipment:
Designed to be compatible with standard semiconductor processing equipment, allowing for seamless integration into existing workflows.
Durability and Reusability:
Made to be durable and reusable, TC wafers can undergo multiple cycles of high-temperature processes without significant degradation.
Applications of TC Wafers
Chemical Vapor Deposition (CVD):
Ensuring uniform temperature distribution during the deposition of thin films.
Etching:
Monitoring and controlling the temperature during plasma etching to achieve precise patterning.
Annealing:
Measuring temperatures during annealing processes to ensure proper activation of dopants and stress relief in the wafer.
Rapid Thermal Processing (RTP):
Providing accurate temperature profiles during rapid heating and cooling cycles.
Oxidation:
Controlling the temperature during oxidation processes to form high-quality oxide layers on the wafer surface.
Epitaxy:
Ensuring temperature consistency during the growth of epitaxial layers.
Benefits of Using TC Wafers
Improved Process Control:
Enhanced ability to control and optimize semiconductor manufacturing processes by providing precise temperature data.
Higher Yield and Quality:
By maintaining optimal temperatures, TC wafers help achieve higher yields and better-quality semiconductor devices.
Reduced Downtime:
Early detection of temperature anomalies allows for quicker adjustments and reduces process downtime.
Process Development and Optimization:
Facilitates the development and fine-tuning of new processes by providing detailed temperature profiles.
TC wafers are essential tools in semiconductor manufacturing, providing critical temperature measurement and control capabilities that enhance process efficiency, quality, and reliability.
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FAQ
Yes. Define each length of L1, L2, L3 ( Mainly consider the length that TC-wafer placed in the chamber)
Yes. We provide flexible customization service to meet our client’s needs.
Not really the same. The temperature in process should be consider when choosing the correct item. For example, TC-wafer can test within 1200℃, but On Wafer system can only test under 100℃.
