What Is On Wafer

What is On Wafer Temperature Measurement System?

The Wireless On-Wafer Temperature Measurement System is a groundbreaking innovation in semiconductor manufacturing, designed to measure and record the impact of the dry etch process environment on production wafers. Embedded directly in a wafer, this advanced system offers unparalleled insights under actual process conditions, eliminating the need for wired connections.

Key Features

Wireless Monitoring: Embedded in the wafer, our system enables real-time, wireless temperature monitoring during the dry etch process, providing accurate and immediate data without cumbersome wires.

Comprehensive Data Collection: Measure and record temperature data under conditions identical to the product process, ensuring the most relevant and actionable insights.

Process Calibration: Designed to help process engineers calibrate etch process conditions, ensuring optimal performance and uniformity across the wafer.

Uniformity Improvement: Enhance the uniformity of temperature profiles, leading to consistent and high-quality production outcomes.

Chamber Matching: Verify and match the temperature profiles of different etch chambers, ensuring consistent performance across all processing equipment.

Post-Maintenance Validation: Validate process conditions and performance after preventive maintenance (PM), reducing downtime and ensuring optimal operation.

Benefits

Precision Control:

Achieve unparalleled precision in temperature measurement, enabling fine-tuning of etch process conditions for optimal results.

Enhanced Uniformity:

Improve the uniformity of temperature profiles across the wafer, leading to more consistent and reliable production outcomes.

Real-Time Data:

Access real-time temperature data during the dry etch process, allowing for immediate adjustments and optimizations.

Increased Efficiency:

Streamline the calibration, verification, and validation processes, reducing downtime and increasing overall production efficiency.

Quality Assurance:

Ensure that all etch chambers perform consistently, enhancing the quality and reliability of your semiconductor devices.

Applications

Etch Process Calibration:

Adjust and fine-tune etch process conditions based on accurate, real-time temperature data.

Chamber Matching:

Match temperature profiles between different etch chambers to ensure uniform performance.

Post-Maintenance Validation:

Validate process conditions after preventive maintenance to ensure optimal equipment performance.