On Wafer System
On Wafer System
- Wafer size: 8″, 12″
- Temperature precision: ±0.1℃-0.2℃
- Temperature measure range: 15-100℃
- Number of measurement point: 1~81
Product Introduction
On Wafer System – Actual Monitoring Wafer Temperature On Dry Etch Process
The Wireless On-Wafer Temperature Measurement System is a complete measurement system embedded in a wafer that can measure and record the impact of the dry etch process environment on production wafers under actual process conditions, without the need for wired connections. The on wafer system can actually monitoring wafer temperature on dry etch process, designed to calibrate, improve uniformity and match temperature profiles.
By measuring temperature data at conditions close to the product process, the On-Wafer wireless temperature measurement system can help process engineers adjust etch process conditions, verify and match chambers, and validate after PM.
Specifications
No. | Item | Specification |
1 | Wafer size | 8”,12” |
2 | Base material | Silicon |
3 | Surface material | Silicon |
4 | Number of measurement point | 81/support customization |
5 | Sensor type | IC |
6 | Calibration range | 15-100℃ |
7 | Operating temperature range | 12-100℃ |
8 | Tolerance | 0.1℃/0.2℃ |
9 | Sensor to Sensor | ≤0.1℃/0.2℃ |
10 | Connection type | RF |
11 | Power source | Battery |
12 | Charging method | Wireless charging |
13 | Sampling frequency | 4Hz |
Software demostration Interface
Applications
Insulator plasma etching (EtchTemp)
Conductor plasma etching (EtchTemp-HD, EtchTemp SE-HD, EtchTemp-SE)
Ion implantation | 20-140°C
Customization
1. Determine the temperature accuracy requirements and dimensions.
2. Determine the usage environment and whether it meets the requirements (currently, 8-inch wireless temperature measurement wafers can be used in plasma and ESC environments).
3. Determine the number and arrangement of points.
Contact Us
Send us an inquiry! We will reply within 24 hours!
FAQ
Yes. Define each length of L1, L2, L3 ( Mainly consider the length that TC-wafer placed in the chamber)
Yes. We provide flexible customization service to meet our client’s needs.
Not really the same. The temperature in process should be consider when choosing the correct item. For example, TC-wafer can test within 1200℃, but On Wafer system can only test under 100℃.