Feature Product
12" Wireless On-Wafer Temperature Measurement System
- Wafer Size: 8”，12”;
- Point of Measurement: 65、81、96;
- Temperature Range: 12-100℃;
- Connection: RF
Product Catalog
TC Wafer
TC Wafer is a temperature sensor that uses a special processing technology to embed high-temperature resistant sensors (thermocouples) at specific locations on the wafer surface, thus realizing real-time temperature measurement of the wafer surface.
RTD Wafer
RTD Wafer is a temperature sensor that uses a special processing technology to embed temperature sensors (RTDs) at specific locations on the wafer surface, thus realizing real-time temperature measurement of the wafer surface.
Wireless TC Wafer
With wireless sensor attaches to the top of a silicon wafer, the wireless TC wafer is used to monitor and measure temperature condition during such wafer processing: 1. Front Track Systems 2. SC Hot Plates 3. Cold Plates 4. HMDS Chambers 5. Coating/Developing.
ATS Wafer
The ATS Wafer is a special processing technology that combines a circuit board with image capturing capabilities with a carbon fiber chassis, which can be used to locate objects by capturing images of their location and obtain offset data (X, Y) to quickly calibrate wafer transfer positions.
Our Advantages
Striving for excellence in temperature measurement accuracy, precision, temperature range, and customized services, ranking among the top tier of the semiconductor temperature measurement market!
> High accuracy
> Precise tempreture measurement
> Powerful thermal field system
> Highly flexible customization service
Software Demostration Interface
TC Wafer Software Interface
RTD Wafer Software Interface
On-Wafer Software Interface
AMS Wafer Software Interface
Applications
TC Wafer
> Furnace
> PVD chamber
> CVD chamber
> RTP/rta chamber
> Strippers
> Vacuum Reflow Oven
> ECP：oring（180℃-300℃）
RTD Wafer
>Front Track Systems
>Coating and Developing
>ESC for ETCH
>Hot Plates
>Cold Plates
On Wafer
>Plasma Etch poly
（EtchTemp）
>Plasma Etch metal（
EtchTemp-HD、EtchTemp SE-HD、
EtchTemp-SE）
>Ion implantation(20-140°C)
Contact Us
Send us an inquiry! We will reply within 24 hours!
FAQ
Yes. Define each length of L1, L2, L3 ( Mainly consider the length that TC-wafer placed in the chamber)
Yes. We provide flexible customization service to meet our client’s needs.
Not really the same. The temperature in process should be consider when choosing the correct item. For example, TC-wafer can test within 1200℃, but On Wafer system can only test under 100℃.
